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News
In-situ monitoring of 2D materials epitaxy during chemical vapor deposition
Data Sheet EpiX C2C
Optimizing epitaxial layer uniformity by combining in-situ and ex-situ metrology
Discontinuation of NI PCIe 6025 software support
LayTec to supply two InspiRe systems for in-situ monitoring of perovskite formation to Helmholtz Innovation Lab HySPRINT at Helmholtz-Zentrum Berlin
In-line thickness monitoring during R2R OLED and OPV manufacturing
Benefits of integrated metrology
Quick identification of process deviations
Optimization of thin-film quality
Enhancement of production efficiency and yield
Fast transfer of established processes
Fast track to new materials and processes
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