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첨단 공정을 위한 LayTec사의 계측기기
News
Talk at the IEEE Photonics Conference in Rome:
In-situ and in-line metrology in frontend production of ultra-high-yield diode lasers
Talk at the Perovskite Forum 2024:
In-situ and in-line quality control for perovskite formation from lab-scale to industrial production
Talk at apc|m Conference 2024: ICP-etching of GaN HFET structures: real time statistical process control of nm-thick GaN layers by means of end point detection
AlignR: LayTec’s solution for assisted alignment of wafer bow-resistant measurement heads
New video available on YouTube: Follow an epi-wafer on its path through the EpiX station
Watch the recording from the "Non-destructive Quality Control of PV Module Encapsulation" webinar featuring Dr. Christian Camus
T
alk on "Connected metrology" at the Malvern Panalytical Future Days event on YouTube
Connected metrology - characterizing complex layer stacks along the manufacturing chain
In-situ growth control during MOVPE of far-UV-C LED structures with optical metrology
In-situ monitoring of 2D materials epitaxy during chemical vapor deposition
Benefits of integrated metrology
Quick identification of process deviations
Optimization of thin-film quality
Enhancement of production efficiency and yield
Fast transfer of established processes
Fast track to new materials and processes
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