첨단 공정을 위한 LayTec사의 계측기기
- In-situ monitoring of 2D materials epitaxy during chemical vapor deposition
- Data Sheet EpiX C2C
- Optimizing epitaxial layer uniformity by combining in-situ and ex-situ metrology
- Discontinuation of NI PCIe 6025 software support
- LayTec to supply two InspiRe systems for in-situ monitoring of perovskite formation to Helmholtz Innovation Lab HySPRINT at Helmholtz-Zentrum Berlin
- In-line thickness monitoring during R2R OLED and OPV manufacturing
Benefits of integrated metrology
- Quick identification of process deviations
- Optimization of thin-film quality
- Enhancement of production efficiency and yield
- Fast transfer of established processes
- Fast track to new materials and processes
