In-situ metrology 

In-situ is a Latin phrase that translates literally to “in position”. Used in the context of process monitoring, it means that in-situ tools observe in real-time the formation of the thin film throughout the thin film deposition process. LayTec’s in-situ metrology enables the development of new thin-film processes, materials and structures. In established processes, it is a must for high yields and maximum uptimes. LayTec’s in-situ monitoring solutions are the most advanced on the market today. Our systems cover a complete range of thin-film applications, providing access to all significant thin film growth parameters.

EpiTT family of products includes EpiTT, EpiTwin TT and EpiTriple TT. These in-situ metrology tools combine emissivity corrected pyrometry for true wafer temperature and  measurements of reflectance at three wavelengths for real-time growth rate, layer thickness, roughness and other layer qualities   ... more

 

The EpiCurve® TT family of products combines wafer curvature measurements with all the features of EpiTT. EpiCurve® TT, EpiCurve®Twin TT and EpiCurve®Triple TT are used for strained layer stacks and help avoid cracks, achieve flat wafers and control temperature homogeneity.   ... more

 

Pyro 400  provide precise real surface temperature measurements of GaN on sapphire and of SiC, and enable direct growth control of InGaN MQW layers. ... more

 

EpiRAS® TT is used for cubic semiconductors for III-V surface and interface analysis in the R&D stage. The in-situ system provides data on wafer temperature, growth rate, color-plot (RAS/sR) fingerprints, composition, morphology and doping levels. ... more

 

The products of the EpiR TT family are applied for spectroscopic analysis of film thickness, composition, 3D topography and other layer qualities in the R&D stage ... more