EpiTT combines measurements of temperature and reflectance at three wavelengths in one tool. For True Temperature (TT), we apply the method of Emissivity Corrected Pyrometry, which delivers the precise surface temperatures of opaque materials at 950 nm (Si, GaAs, InP). For materials that are transparent at 950 nm (GaN, Sapphire, SiC), EpiTT measures the temperature on the top side of the carrier. Measuring reflectance at three wavelengths monitors all essential properties of the growing layers, such as growth rate, film thickness, stoichiometry changes and morphology.
EpiTT offers industry-standard metrology for all kinds of epitaxial growth systems and is compatible with different main rotation frequencies in the range from 0-1500 rpm.
EpiTT Gen3 is the first in-situ system of the next metrology generation. Gen3 offers high flexibility of customization: hardware and software modularity, a great choice of process interfaces and a significantly improved real-time and post-growth analysis functionality make Gen3 class to the most innovative and robust in-situ metrology available today. …more
LayTec offers multi-head configurations of tools in the EpiTT family, which are specifically designed for multiple wafer ring reactors. These models have two (EpiTwin TT) or three (EpiTriple TT) optical heads for taking temperature and reflectance measurements at independent positions. Nearly all the LayTec EpiTTs can be upgraded to multi-head systems.
Both emissivity-corrected temperature monitoring and reflectance measurement at three wavelengths are included in all products in our EpiCurve® TT family of products. For reactors with multiple wafer ring configurations, the models with two or three EpiTT heads (EpiCurve®Twin TT and EpiCurve®Triple TT) allow for temperature and reflectance measurements at two or three independent positions respectively. ###NOHIDE###
For our systems that contain an EpiTT optical head, we offer a unique temperature calibration tool AbsoluT. This small, handheld device sets up exactly the same absolute temperature reference point for pyrometry measurements on each EpiTT head, on different rings and in different reactors and runs, enabling perfect ring-to ring, reactor-to-reactor and run-to-run temperature calibration. ... more ###NOHIDE###
All LayTec in-situ systems are equipped with LayTec software specially developed for process optimization, analysis and control. Our software solutions can control several systems in an MOCVD fab, monitoring all runs simultaneously and supporting operators when making “stop or go” decisions based on Advanced Process Control (APC). ... more
All products in the EpiTT family (EpiTT, EpiTwin TT, EpiTriple TT) are available for various MOCVD growth systems such as:
• systems with satellite rotation
• showerhead-like systems
• systems with main susceptor rotation speed up to 1500 rpm
• R&D type and customized MOCVD growth systems
Complex multilayer structures are the backbone of logic and memory devices manufactured nowadays by semiconductor industry. EpiTT UV is the tool of choice for monitoring the growth of complex multilayer stacks in plasma-enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) as well as epitaxial methods. ...more
LayTec’s sensors are adaptable to many MBE systems by Riber, Veeco, DCA and VG. Adaptation to other manufacturers’ products and custom-built systems is available on request. Find more in our Application Notes:
In HVPE applications, EpiTT controls:
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and many others
Full performance up to 1500 rpm main susceptor rotation!