EpiX Mapping stations combine an XY-mapping stage with LayTec spectroscopic reflectance and photoluminescence metrology systems for a comprehensive 2D analysis of optical wafer properties by non-contact measurements. Integrated software provides full automated data analysis, including detection of VCSEL optical parameters (cavity dip, stop-band position), single layer and multiple layer thickness fits, film composition and multiple-peak analysis. Moreover, customers benefit from sample’s statistics and pass/fail classification on wafer-level and die-level.
The basic design feature of EpiX mapping stations is modularity and customizability in hardware and software. This is key for customers regularly adjusting their research projects to new materials and latest nano-science concepts. Hence EpiX is designed as a long-lasting workhorse with multiple upgrade options: more optical heads (wafer bow, reflectance-anisotropy, sheet-resistance, wafer thickness, optical transmission), extended wavelength range, software interfaces (e.g. for user-owned spectral analysis libraries) and for using in-situ data measured during epitaxy in center of wafer as starting point for post-epi 2D mapping analysis.