EpiTT combines reflectance and emissivity-corrected pyrometry allowing an accurate online surface temperature measurement better than ±1 K. Online growth rate analysis with an accuracy up to ±0.001nm/s is achieved based on LayTec's unique high-temperature data base for a wide range of materials.
EpiTT offers an additional reflectance measurement at a customised second wavelength.

For further details see:

• EpiTT datasheet
• related application notes

Control and analysis software: EpiNet 1.10

• best performance and reliability for production environments
• convenient display showing temperature, growth rate, refractive index and absorption coefficient
• two user levels for configuration and calibration (operator and advanced)
• integration into epitaxy control software (e.g. AIXact)
• convenient remote control features from the growth recipe
• linescans across each wafer and the whole susceptor
• in multi-wafer systems: measurement at different positions on the wafer providing reflectance and temperature gradients across each wafer
• automated growth rate fits after the run

For the real wafer temperature control in GaN processes we offer Pyro 400 – a unique UV sensor as an add-on for EpiTT

For more sophisticated monitoring with spectroscopic reflectance capability please take a look at the EpiR TT  sensor page.

LayTec offers solutions with two or more EpiTT optical heads which are integrated into one unit (EpiTwinTT/EpiTriple TT). These products provide complete control of every wafer in multiple ring configurations (i.e. TSSEL CCS 19x2“, 31x2“ or 20x3“) and easy uniformity checks between inner and outer rings.