Take your bows out!
EpiCurve®TT is an optical in-situ sensor for monitoring of epitaxial growth. It features wafer curvature measurement, emissivity-corrected wafer temperature and high-accuracy reflectance measurement for growth rate analysis.
EpiCurve®TT is designed for use in a wide variety of MOCVD and MBE systems, including AIX Planetary®, CCS® systems and diverse MBE systems. We also offer solutions with two or more optical heads for temperature measurements.
Find more in the according datasheets:
AIXTRON single wafer | AIXTRON CCS | MBE reactors: | |
|---|---|---|---|
EpiCurve®TT Two |
The new EpiCurve®TT AR version with advanced resolution (AR) includes all features of the basic model and measures additionally aspherical bow in 2 directions (x;y). The version with a blue laser gives advanced information on double-side polished and patterned substrates.
Control and analysis software: EpiNet 1.10
- best performance and reliability for production environments
- convenient display showing temperature, growth rate, refractive index and absorption coefficient
- two user levels for configuration and calibration (operator and advanced)
- integration into epitaxy control software (e.g. AIXact)
- convenient remote control features from the growth recipe
- linescans across each wafer and the whole susceptor
- in multi-wafer systems: measurement at different positions on the wafer providing reflectance and temperature gradients across each wafer
- automated growth rate fits after the run
For further details see the related application notes >
